OXFORD, England — Semiconductor research consortium International SEMATECH (ISMT) and microstepper developer Exitech Ltd. said Monday (July 28, 2003) that they had agreed to develop an aerial image ...
SANTA CLARA, Calif. — While several industry R&D groups and suppliers are scrambling to develop next-generation lithography (NGL) based on extreme ultraviolet (EUV) technology, KLA-Tencor Inc. and ...
As the Extreme Ultraviolet (EUV) lithography ecosystem is being actively mapped out to enable sub-7nm design rule devices, there is an immediate and imperative need to identify the EUV reticle (mask) ...
At the ongoing SEMICON Taiwan 2017, KLA-Tencor is showcasing its new FlashScan reticle blank inspection product line which represents the company's entry into the dedicated reticle blank inspection ...
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